Direct fabrication of thin layer MoS2 field-effect nanoscale transistors by oxidation scanning probe lithography
نویسندگان
چکیده
منابع مشابه
Advanced oxidation scanning probe lithography.
Force microscopy enables a variety of approaches to manipulate and/or modify surfaces. Few of those methods have evolved into advanced probe-based lithographies. Oxidation scanning probe lithography (o-SPL) is the only lithography that enables the direct and resist-less nanoscale patterning of a large variety of materials, from metals to semiconductors; from self-assembled monolayers to biomole...
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ژورنال
عنوان ژورنال: Applied Physics Letters
سال: 2015
ISSN: 0003-6951,1077-3118
DOI: 10.1063/1.4914349